全程免费，清大自强基金的最优质的课程选择！！
http://edu.tcfst.org.tw/edm/04A366/04A366_a.html
研讨会介绍：
The workshop will focus on the fundamentals of plasma etching and deposition.
Lectures will include an introduction to vacuum technology, the basics of
plasma and plasma reactors and an overview of mechanisms for etching and
deposition. Presentation material will review state-of-the-art etching and
deposition technologies as applied to semiconductor, MEMS, and nanofabrication
Talks will cover compound semiconductor, dielectric, and deep silicon etching
as well as PECVD and high density plasma CVD of silicon based materials.
New technology of Plasma Dicing will be also presented.
时间：2015年6月22日 周一 AM 09：00~PM 17：00
地点：清华大学合勤演艺厅
咨询专线：03-5735521 分机 3227 吕小姐
机会难得，敬请把握良机！！
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